Derived an expression to work out the exposure needed to saturate a gap with specified dimension, as already discussed in Sec. V A 1. For an unsaturated exposure, the Gordon product predicts complete coverage on the pore partitions nearly a depth l A novel method for fabrication of bismuth-silicon dioxide https://ald-growth-mechanisms36036.verybigblog.com/21808398/facts-about-atomic-layer-deposition-revealed